Materials for microlithography : radiation-sensitive polymers /

Materials for microlithography : radiation-sensitive polymers /

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Bibliographic Details
Corporate Authors: American Chemical Society. Division of Polymeric Materials: Science and Engineering, American Chemical Society. Division of Polymer Chemistry, American Chemical Society. Meeting
Other Authors: Thompson, L. F., 1944-, Willson, C. G. (C. Grant), 1939-, Fréchet, J. M. J.
Format: Book
Language:English
Published: Washington, D.C. : The Society, 1984.
Series:ACS symposium series, 266.
Subjects:
Polymers > Congresses.
Photoresists > Congresses.
Microlithography > Materials > Congresses.
Microelectronics > Materials > Congresses.

RIT

Holdings details from RIT
Call Number: TK7871.15.P6 M37 1984