GCA 4800 DSW wafer stepper /

"The following work lays the foundation for the further development of high resolution photolithography at RIT using a GCA 4800 DSW wafer stepper. It has been determined experimentally that . the machine is presently capable of printing 1.4 micrometer lines and spaces with and exposure latitude...

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Bibliographic Details

Main Author:	Comard, Matthew J.
Format:	Thesis Book
Language:	English
Published:	1988.
Series:	Thesis: Electrical Engineering KGCOE. EEEE-MS.
Subjects:	Semiconductor wafers > Equipment and supplies > Design and construction. Semiconductor wafers > Design and construction. Integrated circuits > Design and construction. Microlithography. Photolithography.