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Materials Research Society
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T - Technology
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Author:
Materials Research Society
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T - Technology
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Congresses
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Integrated circuits
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Characterization of plasma-enhanced CVD processes : symposium held November 27-28, 1989, Boston, Massachusetts, U.S.A. /
Published 1990
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Polysilicon thin films and interfaces /
Published 1990
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Materials Research Society
Hess, Dennis W.
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Ibbotson, Dale E.
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Kamins, Theodore I.
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Lucovsky, G.
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T - Technology
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Congresses
Integrated circuits
Design and construction
1
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1
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1
Plasma-enhanced chemical vapor deposition
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Thin film devices
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Rochester Institute of Technology
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